Last edited by Mazuru
Saturday, August 8, 2020 | History

3 edition of Development of a polysilicon process based on chemical vapor deposition of dichlorosilane in an advanced Siemen"s reactor found in the catalog.

Development of a polysilicon process based on chemical vapor deposition of dichlorosilane in an advanced Siemen"s reactor

Development of a polysilicon process based on chemical vapor deposition of dichlorosilane in an advanced Siemen"s reactor

final report covering period October 11, 1982 to May 21, 1983

  • 168 Want to read
  • 14 Currently reading

Published by Hemlock Semiconductor Corporation, National Technical Information Service in Hemlock, Mich, [Springfield, Va .
Written in English

    Subjects:
  • Silicon alloys.,
  • Chemical vapor deposition.

  • Edition Notes

    StatementArvid N. Arvidson, principal investigator ; David H. Swayer, David M. Muller.
    SeriesNASA contractor report -- NASA CR-174445.
    ContributionsUnited States. National Aeronautics and Space Administration.
    The Physical Object
    FormatMicroform
    Pagination1 v.
    ID Numbers
    Open LibraryOL15394484M


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Development of a polysilicon process based on chemical vapor deposition of dichlorosilane in an advanced Siemen"s reactor Download PDF EPUB FB2