Development of a polysilicon process based on chemical vapor deposition of dichlorosilane in an advanced Siemen"s reactor

final report covering period October 11, 1982 to May 21, 1983

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• 14 Currently reading

Published 1983 by Hemlock Semiconductor Corporation, National Technical Information Service in Hemlock, Mich, [Springfield, Va .
Written in

Subjects:

• Silicon alloys.,
• Chemical vapor deposition.

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Edition Notes

Statement	Arvid N. Arvidson, principal investigator ; David H. Swayer, David M. Muller.
Series	NASA contractor report -- NASA CR-174445.
Contributions	United States. National Aeronautics and Space Administration.
The Physical Object
Format	Microform
Pagination	1 v.
ID Numbers
Open Library	OL15394484M

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